TAS Part I14 Premises for electro-plating, electro-polishing, anodising or etching

(1) This Part is applicable to every building where any of the processes of electro-plating, electro-polishing, anodising or etching are undertaken.

(2) Premises for electro-plating, electro-polishing, anodising or etching must—

1. provide for the safety and comfort of workers; and
2. be constructed in a manner that will prevent the escape of liquids and atmospheric contaminants to other areas of the building.

The floor of every plating area must be—

1. so graded as to—
   1. permit easy flushing with water; and
   2. prevent liquids from flowing from the area into other parts or the work place; and
2. chemically resistant to the solutions used in the process.

Every part of a plating area must be not less than 2.7 m in height—

1. measured from the floor to the ceiling if a ceiling is provided; or
2. measured from the floor to the lowest part of the roof if a ceiling is not provided.

In every plating area there must be not less than 14 m³ of air space for each person employed and, in the calculation of such space, the height taken into account must not exceed 4.2 m.

The ceiling of a plating area must be so constructed as to prevent, so far as is practicable, atmospheric contaminants from escaping into rooms or work places, situated above the level of the ceiling.